Since the 1980s, cutting-edge lithography has shifted from the 365 nm 'i-line' of mercury vapour lamps to deep-ultraviolet light from excimer lasers at 248 nm (krypton fluoride lasers) and 193 nm ...

An image of a mask containing the structure of an integrated circuit (IC) is projected onto a silicon wafer, which is coated with a light-sensitive ... Interestingly, DUV lithography at a ...

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